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Polishing Slurries for Multiple Abrasives

Nalco Water is an industry leader in high-quality, effective colloidal silica abrasives for electronic polishing. In addition to our comprehensive product lines for CMP and prime wafer polishing, we provide colloidal silica for various polishing applications including sapphire substrate and hard disk polishing.

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Colloidal Silica for Sapphire Substrate Polishing

Sapphire offers several significant advantages as a substrate (such as stability and optic permeability) for advanced semiconductor and microelectronic devices. However, sapphire substrate can be challenging to process due to its extremely high hardness and low impact strength.

Nalco Water has developed colloidal silica products that provide the quality, consistency, and control appropriate for sapphire substrate polishing.

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Colloidal Silica for Hard Disk Polishing

Colloidal silica is an optimal abrasive for hard disk polishing because it helps create an ultra-smooth, defect-free surface. Our electronic polishing RD&E teams work to ensure our colloidal silica products are optimally effective for hard disk drive manufacturing.

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Customized Electronic Polishing Abrasive Product Development

Our experienced dedicated RD&E teams provide customized silica sol product development to deliver solutions that are tailored to specific business needs and processes. We design products covering a wide range of:

  • Particle Size
  • Particle Size Distribution
  • Stabilized Cation
  • 浓度
  • pH值
  • Package Type
  • Temperature Condition
  • Classification

Sodium-Stabilized Colloidal Silica Products

  • Size (nm): 80
  • Area m2/gm: 40
  • % Solids: 40
  • pH: 8.5
  • Charge: Negative

  • Size (nm): 105
  • Area m2/gm: 30
  • % Solids: 47
  • pH: 10
  • Charge: Negative

  • Size (nm): 60
  • pH: 8.5
  • Stabilizing: Na+
  • SL: 1 year

  • Size (nm): Broad Distribution
  • pH: 11
  • Stabilizing: Na+

  • Size (nm): 4-120, (engineered available)
  • Area m2/gm: 25-750
  • % Solids: 15-50
  • pH: 2-10.5
  • Stabilizing: NH4, NA+, K+
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Nalco Water is a Colloidal Silica Leader

  • First patented colloidal silica manufacturing process in 1941
  • One of the largest colloidal silica manufacturers globally
  • Innovative RD&E teams for customized product development
  • Products designed for manufacturing efficiency, quality, and control
  • Delivering high value through innovative particle design and quality support

Contact Our Colloidal Technologies Experts

Let us know how we can help.

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