Colloidal Silica Solutions for Electronic Polishing
To achieve the highest quality finish, electronic polishing requires precision, consistency, and manufacturing process control. High quality colloidal silica is an optimal abrasive material for various polishing stages of electronic components (e.g., silicon wafers and integrated circuits (ICs)).
纳尔科为多种抛光工艺流程和应用提供硅溶胶解决方案。我们全面的产品系列使客户能够灵活地设计配方,并实现对各种基材抛光性能的可控调节。
Designing Electronic Polishing Solutions For:
Efficient Manufacturing Processes
Low-Metal Content
High Product Quality & Consistency
Tailored Surface and Bulk Physicochemical Properties Include:
- Stiffness
- Purity
- Controlled particle size
- Particle size distribution
- Morphology
Continuous Improvement and Quality Control
The semiconductor industry has been advancing the technology node rapidly and defect reduction and enhancement of operational efficiency is imperative.
Nalco Water emphasizes customer value creation and operational excellence through a strong culture of Continuous Improvement. Our approach integrates multiple methodologies including:
- Lean Six Sigma to drive variation reduction, optimization, and efficiencies in our processes
- Leveraging cutting-edge analytical tools and intelligent technologies to accelerate insights and connect customer performance metrics,
enabling the creation of products tailored to unique customer requirements - Utilizing configuration management and change control solutions that ensure consistent and predictable results
产品、设备和服务
Explore our Electronic Polishing Application Offerings
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Nalco Water is a Colloidal Silica Leader
- First patented colloidal silica manufacturing process in 1941
- One of the largest colloidal silica manufacturers globally
- Innovative RD&E teams for customized product development
- Products designed for manufacturing efficiency, quality, and control
- Delivering high value through innovative particle design and quality support